TRIISOPROPYLSILYL ACRYLATE CAS: 157859-20-6
Catalog Number | XD94186 |
Product Name | TRIISOPROPYLSILYL ACRYLATE |
CAS | 157859-20-6 |
Molecular Formula | C12H24O2Si |
Molecular Weight | 228.4 |
Storage Details | Ambient |
Product Specification
Appearance | White powder |
Assay | 99% min |
Triisopropylsilyl acrylate is an organosilicon compound that is widely used in the field of polymer chemistry. It serves as a reactive monomer in the synthesis of silicone-based polymers and coatings. Triisopropylsilyl acrylate contains a reactive acrylate group that can undergo polymerization reactions, allowing it to be incorporated into various polymeric structures.One of the primary uses of triisopropylsilyl acrylate is in the formulation of coatings and adhesives. The acrylate functionality present in the compound enables it to be copolymerized with other monomers, such as acrylic or methacrylic monomers, to create cross-linked polymer networks. These networks exhibit improved adhesion properties to a wide range of substrates, including metals, glass, and plastics. Triisopropylsilyl acrylate is often used as a reactive diluent in coating formulations, providing increased flexibility and toughness to the cured films.Furthermore, triisopropylsilyl acrylate is highly reactive towards hydroxyl-functional silanes, allowing it to be used as a cross-linking agent in the synthesis of silicone-based polymers. By incorporating triisopropylsilyl acrylate into a polymer matrix, the resulting materials exhibit improved flexibility, weather resistance, and thermal stability. These properties make them suitable for applications such as sealants, adhesives, and elastomers. The presence of the triisopropylsilyl group also imparts water repellency and low surface energy to the polymer, leading to enhanced hydrophobic and oleophobic characteristics.Another important application of triisopropylsilyl acrylate is in the field of lithography. It can be used as a reactive monomer in the fabrication of photoresists, which are materials used in the production of electronics and microdevices. Triisopropylsilyl acrylate-based photoresists exhibit high sensitivity to ultraviolet (UV) light, allowing for precise and high-resolution patterning. After UV exposure and development, the triisopropylsilyl acrylate units are selectively removed, leaving behind well-defined patterns on the substrate.In summary, triisopropylsilyl acrylate is a versatile compound with significant uses in the field of polymer chemistry. Its reactivity as a monomer enables it to be incorporated into polymer networks, enhancing adhesion, flexibility, and other desirable properties. It is commonly used in the formulation of coatings, adhesives, sealants, and elastomers. Additionally, triisopropylsilyl acrylate finds applications in lithography as a component of photoresists for nanoscale patterning. Through its versatile properties, triisopropylsilyl acrylate contributes to the development of advanced materials with a wide range of industrial and technological applications.